Hebei Messi Biology Co., Ltd. stated that the application of magnesium oxide in sputtering targets is mainly reflected in high-speed film formation, application in the microelectronics and photovoltaic industries, specific preparation processes and extensive coating applications. These applications are all due to the physical and chemical properties of magnesium oxide itself.
The application of magnesium oxide (MgO) in sputtering targets is mainly reflected in the following aspects:
High-speed film formation: Magnesium oxide sputtering targets use MgO and conductive substances as the main components. This special composition enables the MgO film formed by DC sputtering to be oriented when forming a film with MgO, thereby achieving a high-speed film formation speed when forming the MgO film.
Application in the microelectronics and photovoltaic industries: With the development of the microelectronics and photovoltaic industries, high-purity magnesium oxide targets have been widely used in electronic products and photovoltaic coatings. Its high purity reduces the interference caused by impurities and improves product stability and service life.
Preparation process: In the preparation process of high-performance oxide ceramic targets, magnesium oxide is one of the common sputtering targets. The oxide slurry is obtained through vacuum ball milling, then slurry molding, and sintering process, high-density, large-size magnesium oxide sputtering target can be obtained.
Coating application: Sputtering thin film coating of magnesium oxide sputtering target has been widely used in industries such as liquid crystal panels, touch screens, thin-film solar cells, and light-emitting diodes. The application of these coatings benefits from the high melting point, excellent insulation, heat resistance, antioxidant and corrosion properties of magnesium oxide.